TY  - GEN
T1  - Computational lithography
T2  - Wiley series in pure and applied optics.
A1  - Ma, Xu, 1983-
A2  - Arce, Gonzalo R.
LA  - English
PP  - Oxford
PB  - Wiley-Blackwell
YR  - 2010
UL  - https://colectivo.uloyola.es/Record/ELB178332
OP  - 226
CN  - TK7872.M3 M3 2010
KW  - Microlithography : Mathematics.
KW  - Integrated circuits : Design and construction : Mathematics.
KW  - Photolithography : Mathematics.
KW  - Semiconductors : Etching : Mathematics.
KW  - Resolution (Optics)
KW  - Electronic books.
ER  -