Description: Computational lithography

Bibliographic Details
Main Author:	Ma, Xu, 1983-
Other Authors:	Arce, Gonzalo R.
Format:	Electronic
Language:	English
Published:	Oxford : Wiley-Blackwell, 2010.
Series:	Wiley series in pure and applied optics.
Subjects:	Microlithography > Mathematics. Integrated circuits > Design and construction > Mathematics. Photolithography > Mathematics. Semiconductors > Etching > Mathematics. Resolution (Optics) Electronic books.
Online Access:	https://recursos.uloyola.es/login?url=https://accedys.uloyola.es:8443/accedix0/sitios/ebook.php?id=178332

Description
Physical Description:	xv, 226 p. : ill.
Bibliography:	Includes bibliographical references and index.